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  • High-NA-EUV lithography: mirroring the future - ZEISS Vision Care
    High-NA-EUV lithography is ZEISS SMT's next technology generation for semiconductor manufacturing and the microchips of tomorrow
  • High-NA-EUV: New technology for global microchip production
    Press release High-NA-EUV: New technology for global microchip production The worldwide unique High-NA-EUV lithography sets new standards for the production of state-of-the-art microchips ZEISS has developed and manufactured the optical system as the heart of this new technology The first machine for the High-NA-EUV lithography was recently delivered by the strategic ZEISS partner ASML The
  • High NA EUV optics - ZEISS
    High NA EUV optics preparing lithography for the next big step Paul Gräupner1, Peter Kürz1, Judon Stoeldraijer2, Jan van Schoot2
  • High-NA EUV Optics – the Key for Miniaturization of Integrated Circuits . . .
    High-NA EUV Optics – the Key for Miniaturization of Integrated Circuits in the Next Decade Bartosz Bilski, Heiko Feldmann, Paul Gräupner, Peter Kürz, Winfried Kaiser Carl Zeiss SMT GmbH, Germany bartosz bilski@zeiss com
  • High-NA benefit assessment through Zeiss AIMS EUV for tip-to-tip . . .
    High-NA EUV lithography is being prepared for the next stage of volume production of state-of-the-art integrated devices First wafer exposures on ASML’s EXE5000 are expected early in 2024 Beyond assessment of the benefit of high-NA by simulation, ZEISS AIMS EUV offers the potential to compare the imaging benefit of 0 55NA to the established 0 33NA, through aerial image analysis of
  • PROCEEDINGS OF SPIE - ZEISS
    In this paper we give an overview of the progress of the ZEISS high-NA EUV optics program First, we discuss high-NA design features like flexibility of the illuminator and its capabilities for the creation of customer-relevant illumination modes as well as the impact of the increased NA onto the projection optics design
  • Hyper-NA: a tool with a numerical aperture (NA) of at least 0. 75
    Hyper-NA, with a numerical aperture (NA) of at least 0 75, is the potential successor to the NXE:3x00 and EXE:5x00-series of scanners This presentation describes the concept for the actual implementation of the Hyper-NA system Unlike the significant increase in system size going from NXE:3x00 to EXE:5x00, the Hyper-NA machine footprint will hardly increase further, facilitating introduction
  • SEMICON Taiwan 2025: Zeiss hits milestone of 10 High NA optic systems . . .
    At SEMICON Taiwan 2025, Zeiss Semiconductor Manufacturing Technology offered a rare glimpse into the future of extreme ultraviolet (EUV) lithography, outlining its optics roadmap from High NA to
  • High-NA-EUV for global microchip production
    High-NA-EUV for global microchip production The first machine for the new lithography technology includes an optical system from Zeiss and was recently delivered by ASML
  • Unlocking the Future: How Hyper-NA EUV is Revolutionizing Chip . . .
    What is Hyper NA EUV and why is it important? Hyper NA EUV is the next big step in chip-making technology Think of it like a super-powered magnifying glass for printing tiny patterns on computer chips It uses a special kind of light and lenses with a higher ‘numerical aperture’ (NA) to make even smaller and more detailed designs
  • High NA EUV optics: a big step in lithographic resolution
    Acknowledgement Special thanks goes to: Many, many people, too numerous to mention all by name The high-NA teams at ASML and ZEISS Our suppliers, customers, and project partners around the globe This work has received funding form the ECSEL Joint Undertaking (JU) under grant agreements No 662338, 698522, 737479, and 783247
  • High NA EUV optics: preparing lithography for the next big step
    In this presentation we will present the status of the high-NA optics program at ZEISS We report on the high NA infrastructure including mirror polishing, coating, surface figure metrology, mirror handling, and integration tooling Progress in manufacturing of mechanics, frames and mirrors at ZEISS for both illuminator and POB will be shown
  • Hyper NA EUV lithography: an imaging perspective
    BackgroundTo print ever smaller features at high contrast projection lithography technology has evolved to shorter wavelength light and larger numerical aperture (NA) After enabling the extreme-ultraviolet (EUV) wavelength, the industry is looking into increasing the NA At NA’s much higher than 0 55, new effects such as polarization will start to play a role, and larger impact of ultimate





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